Date of Award
McConkey, J. W.,
Physics, Fluid and Plasma.
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In this experiment we observe the spectra from RF discharges through SF$\sb6,$ CF$\sb4$ and CH$\sb4$ and some mixtures of these and helium over the wavelength range of 115-315 nm. In the spectra of SF$\sb6,$ strong sulphur atomic lines were observed to cover the wavelength range of 120-195 nm. Fluorine features should be even stronger, but no fluorine lines were observed because their wavelengths are shorter than 100 nm and are cut off by the MgF$\sb2$ window on the detector. The intensity-pressure variations of SI lines have been established in chapter 4 as well as the relative intensity ratios for lines within multiplets. Strong oxygen lines and SO (A-X) and (B-X) systems show up at 240-300 nm. Some SiI lines are prominent especially in 1% SF$\sb6$ in He mixtures. These are explained as the product of the reaction between active F atoms and the glass discharge walls. Hydrogen Lyman $\alpha,$ NI lines, N$\sb2$ and NO $\gamma$ and $\beta$ systems were also observed as impurities. The intensities were found to vary directly with the power imput. SO band-intensities were observed to build up much more rapidly with time than S line-intensities within the discharge. Three strong CO systems dominate the spectra of CF$\sb4.$ The CO features were so strong that only a few carbon lines were observable even in 1% of CF$\sb4$ and He mixtures. The CO is most probably formed from the interaction of C atoms from the break up of CF$\sb4$ in the discharge and O$\sb2$ released from the glass walls of the discharge vessel by an F-etching process. (Abstract shortened by UMI.)Dept. of Physics. Paper copy at Leddy Library: Theses & Major Papers - Basement, West Bldg. / Call Number: Thesis1995 .L50. Source: Masters Abstracts International, Volume: 34-06, page: 2389. Adviser: J. W. McConkey. Thesis (M.Sc.)--University of Windsor (Canada), 1995.
Li, Jan., "VUV spectroscopy of RF plasma sources." (1995). Electronic Theses and Dissertations. 4544.