Reactively sputter-deposited titanium oxide and barium silicon titanate thin films.

Author

Toru Yamashita, University of Windsor

Date of Award

1-1-1987

Publication Type

Doctoral Thesis

Degree Name

Ph.D.

Department

Mechanical, Automotive, and Materials Engineering

Keywords

BA2SI2TIO8, BARIUM, BARIUM SILICON TITANATE, Barium silicon titanate, DEPOSITED, FILMS, OXIDE, REACTIVE SPUTTERING, REACTIVELY, Reactive sputtering, SILICON, SPUTTER, THIN, THIN FILMS, TIOX, TITANATE, TITANIUM, TITANIUM OXIDE, Thin films, Titanium oxide

Rights

info:eu-repo/semantics/openAccess

Creative Commons License

This work is licensed under a Creative Commons Attribution-NonCommercial-No Derivative Works 4.0 International License.

Recommended Citation

Yamashita, Toru, "Reactively sputter-deposited titanium oxide and barium silicon titanate thin films." (1987). Electronic Theses and Dissertations. 6149.
https://scholar.uwindsor.ca/etd/6149